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For the analysis of hydrogen and helium in solids and thin films by secondary ion mass spectrometry, the use of Cs + primary ions in conjunction with the detection of HCs + and HeCs + molecular ions is proposed. For both species, detection limits of the order of 10 19 atoms cm −3 are obtained at sputter removal retes of ∼1 nm s −1 . A relative depth resolution of ∼2% is demonstrated for hydrogenated amorphous Is layers on single‐crystal Si. In these specimens, the HCs + intensities scale linearly with the hydrogen concentrations c H in the range investigated ( c H < 20at.%); hence, a quantitative evaluation of the H content appears possible by means of a single standard.
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Gnaser et al. (1991) studied this question.
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