We demonstrate nearly diffraction-limited printing of 0.2-microm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 microm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.
No takes yet. Share an insight, caveat, or question.
Berreman et al. (1990) studied this question.
Synapse has enriched 3 closely related papers on similar clinical questions. Consider them for comparative context: