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The p-GaN gate high electron mobility transistor (HEMT) with a2.0× 10^-5cm2 sensitive area as a UV photodetector (PD) has been designed and fabricated in this study. AlGaN/gallium nitride (GaN) heterostructure was adopted to get a 2-D electron gas (2DEG) as a conductive channel, resulting in a high photoresponsivity of8.07× 10^4A/W, a sharp cutoff wavelength at 360 nm, high UV-to-visible rejection ratio of1.80× 10^6, rise and decay time of 0.12 and 1.0 ms, respectively. The dark current of5.44× 10^-7A, the photocurrent of4.42× 10^-3A at 5 V, the external quantum efficiency (EQE) of 2.77%× 10^5%, and the detectivity of8.31× 10^14Jones for the UV PD were determined under a low UV light intensity of 5 mW/cm2 at 360-nm UV illumination. The obtained results show that the performance of as-fabricated UV PD based on AlGaN/GaN HEMT is significantly improved compared to the literature. This device, which has lower noise equivalent power (NEP) and enhanced detectivity features compared to existing ones, is a promising candidate for military and space applications.
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Yılmaz et al. (2025) studied this question.
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