Fabrication of nanocontacts for molecular devices using nanoimprint lithography

We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process of nanoimprint lithography (NIL) and electromigration. First, 20 nm wide gold nanowires were fabricated by NIL on a silicon dioxide substrate. Then by passing an electric current through a nanowire, the nanowire is split into two wires with a gap as small as sub-10 nm by electromigration. This fabrication method offers a fast and effective process for producing large numbers of nanocontacts for use in molecular self-assembly, and thus greatly enhances the probability of successful capture of single molecules.