The growth and structure properties of Cd1−xFexTe thin films prepared by rf sputtering were studied. Films with thicknesses in the range 0.75–2.45 μm were grown onto Corning glass substrates at temperatures between 50 and 300 °C in an argon atmosphere at a pressure of 3 mTorr. The deposition rate was determined by film thickness profile analysis. Transmission electron microscopy and x-ray diffractometry techniques were used to evaluate the structure, grain size, and orientation of the films. These properties were found to be related to the substrate deposition temperature.
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Álvarez-Fregoso et al. (1988) studied this question.
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