Low Temperature MOCVDof Conducting, Micrometer-Thick, Silver Films

Silver layers up to 3 μm thick have been deposited at 250–510 °C using a simple powder flash evaporation MOCVD procedure with a silver pivalate as the volatile precursor. Carbon-free deposits could be obtained at temperatures ≥ 310 °C. A very high deposition rate of 10 μm h−1 has been achieved. The silver layers were dense and conducting. Properties of silver pivalate, and the influence of deposition temperature on film microstructure, are discussed. The procedure is a cheap and robust route to silver coatings.