The paper studies the testing of modern numerical methods for studying the electrophysical characteristics of semiconductor devices. Using the diffusion-drift model, the electrophysical characteristics of the selected transistor are calculated. An original program code was also developed for modeling ballistic electron transport in nanotransistors (topological dimensions of ~10 nm) taking into account defects in the atomic structure. Modeling the characteristics of a field-effect nanotransistor showed that a violation of the crystal structure of the transistor leads to degradation of the I–V curve.
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I. K. Gainullin (2024) studied this question.
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