The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process

Hyeongtag Jeon; Youngdo Won

doi:10.1063/1.2991288

September 22, 2008Applied Physics Letters

The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process

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Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Hyeongtag Jeon, Youngdo Won; The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process. Appl. Phys. Lett. 22 September 2008; 93 (12): 124104. https://doi.org/10.1063/1.2991288 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioApplied Physics Letters Search Advanced Search |Citation Search

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Jeon et al. (2008) studied this question.

synapsesocial.com/papers/6aacf25bad3ef4927463613f https://doi.org/10.1063/1.2991288

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The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process

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The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process

Abstract

Discussion

Cite This Study

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