A monocrystalline silicon wafer with a porous Si surface is an ideal seed for the epitaxial growth of thin monocrystalline Si films. After growth, we process a solar cell into the epitaxial film without using costly photolithography. We glue the cell to a glass carrier and separate it from the growth substrate at the porous Si layer. The substrate wafer is re-usable. We achieve an independently confirmed power conversion efficiency of 15.4% with a 25.5 μm-thick cell (3.88 cm2) using layer transfer with porous Si.
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Brendel et al. (2003) studied this question.