Stable high-field anodization (1500–4000 A m −2 ) for the fabrication of highly ordered porous anodic alumina films has been realized in a H 3 PO 4 –H 2 O–C 2 H 5 OH system. By maintaining the self-ordering voltage and adjusting the anodizing current density, high-quality self-ordered alumina films with a controllable inter-pore distance over a large range are achieved. The high anodizing current densities lead to high-speed film growth (4–10 µm min −1 ). The inter-pore distance is not solely dependent on the anodizing voltage, but is also influenced by the anodizing current density. This approach is simple and cost-effective, and is of great value for applications in diverse areas of nanotechnology.
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Li et al. (2006) studied this question.