We have applied the modified droplet epitaxy method using sulfur termination to fabricate InAs quantum dots on GaAs(001) substrates for the first time. It is observed that the S-terminated surface effectively prevents the two-dimensional growth of InAs, forming InAs nanocrystals. From the magneto-photoluminescence measurements of this structure, three-dimensional quantum confinement effect was confirmed. This modified droplet epitaxy method is promising for the fabrication of quantum dots, not only in the lattice-matched system but also in the lattice-mismatched system.
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Mano et al. (2000) studied this question.
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