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July 1, 2012Japanese Journal of Applied Physics

Impact of Deposition Temperature of the Silicon Oxide Passivation on the Performance of Indium Zinc Oxide Thin-Film Transistors

Min Li Linfeng Lan Miao Xu Hua Xu Dongxiang Luo Nana Xiong Junbiao Peng

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Abstract

Impact of Deposition Temperature of the Silicon Oxide Passivation on the Performance of Indium Zinc Oxide Thin-Film Transistors, Li, Min, Lan, Linfeng, Xu, Miao, Xu, Hua, Luo, Dongxiang, Xiong, Nana, Peng, Junbiao

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Cite This Study

Li et al. (2012) studied this question.

synapsesocial.com/papers/6aadef3a6ec14db9de8745c3 https://doi.org/10.7567/jjap.51.076501

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