Preparation of Ultrahigh-Density Magnetic Nanowire Arrays beyond 1 Terabit/Inch2 on Si Substrate Using Anodic Aluminum Oxide Template

Ultrahigh-density Co nanowire arrays were fabricated by the combined use of the anodic aluminum oxide (AAO) template formed on a Si substrate and pulse DC electrodeposition. The AAO templates were prepared with the anodic voltages from 3 to 40 V, whose diameters were from 15 to 40 nm. Using the AAO template with an anodic voltage less than 3 V, the wire density exceeded 2.88 Tbit/in.2. The magnetic property of the nanowire arrays indicated a strong perpendicular magnetic anisotropy, and we observed the tendency of increase in coercivity with decreasing nanowire diameter.