Growth optimisation of the GaN layers and GaN/AlGaN heterojunctions on bulk GaN substrates using plasma-assisted molecular beam epitaxy

Influence of growth conditions in plasma assisted molecular beam epitaxy on quality of GaN layers and GaN/AlGaN heterojunctions is studied. The growth diagram for step-flow growth mode and different nitrogen flux is presented. The low defect density of bulk GaN substrates together with very low impurity background concentrations resulted in high electron mobility for GaN/AlGaN heterojunctions: 109,000 cm2/Vs at 1.5 K, and 2500 cm2/Vs at 295 K. (© 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)