Photoalignment and realignment of nanocylinder domains of a polystyrene-based block copolymer film in both in-plane and out-of-plane modes are successfully attained by irradiating with linear polarized (LPL) or nonpolarized light at 436 nm followed by annealing. This photocontrol allows the on-demand 3D photoalignment and micropatterning of the nanostructures.
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Morikawa et al. (2007) studied this question.
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