A toluene solution of 4,4′‐methylenebis(2,6‐diethylaniline) was spin coated on Si wafers. The samples were derivatized with pentafluorobenzaldehyde (PFB) in order to determine the primary amino groups on the surface. XPS C 1s and N 1s and C and N K‐edge NEXAFS of underivatized and derivatized films were carefully analyzed. The result was that after 10 min of exposure the gas–surface reaction was already completed. A reasonable derivatization reaction yield in the order of 90% is derived from the experiments. This number correlates well to a reaction yield obtained by a wet chemical approach.
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YEGEN et al. (2008) studied this question.
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