Iodonium functionalized polystyrene as non-chemically amplified resists for electron beam and extreme ultraviolet lithography

This is the authors' abstract. We don't add key points for this paper.

A non-chemically amplified resist (n-CAR) based on iodonium functionalized polystyrene (PSNA 0.4 ) was developed for extreme ultraviolet lithography, achieving 22 nm L/S patterns at a dose of 90.8 mJ cm −2 , underscoring its high sensitivity for n-CARs.