Deposition of (Zn, Mn)2SiO4 for plasma display panels using charged liquid cluster beam

Films of manganese doped zinc silicate have been deposited using the charged liquid cluster beam technique. The deposition conditions were found to have a large impact on the morphology and photoluminescence intensity of these films. The photoluminescence intensity was maximized at a manganese content near δ=0.04 in (Zn1−δMnδ)2SiO4. No phases other than zinc silicate were detectable with manganese contents up to δ=0.08.