SiO2 pillar arrays with high aspect ratios were fabricated by nanoimprinting using ordered anodic porous alumina as a mold. The size and shape of SiO2 pillars could be controlled by changing the geometrical structures of the anodic porous alumina mold. The used of the obtained SiO2 fine patterns composed of ordered arrays of tapered pillars could effectively suppress the reflectance of incident light at the surface of the sample.
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Yanagishita et al. (2010) studied this question.
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