Reaction mechanisms between platinum acetylacetonate Pt(acac)2 and O2 or water vapor to deposit nanostructured, conductive platinum thin films at 240–300 or 280–440 °C respectively, are studied to elucidate the effects of experimental parameters on the film microstructure and resistivity. The use of water vapor during the decomposition process of Pt(acac)2 permits slower, homogeneous film growth along the reactor. Although decomposition of Pt(acac)2 assumes different characteristics in the presence of O2 and H2O, a universal trend crystallite size–resistivity was found for almost all obtained films, representing a starting point for correlation of experimental conditions with applicative performances.
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Battiston et al. (2005) studied this question.
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