Temperature-Dependent Infiltration of Polymers during Sequential Exposures to Trimethylaluminum

Atomic layer deposition provides the opportunity to introduce nanoscale inorganic coatings to organic polymers creating coatings of varied compositions of finish with distinctive interfaces. Prior research has shown that ALD materials nucleation on polymers varies in composition and structure based on how the precursor interacts with the polymer chemistry and the process conditions. To study this in more detail, in situ quartz crystal microgravimetry is employed to understand the infiltration and saturation behavior of trimethylaluminum in polyamide-6, poly(acrylic acid), poly(ethylene terephthalate), and poly(methyl methacrylate). Emphasis is placed on understanding reactive vapor diffusion into these polymers as the exposure temperature is varied. Finally, we propose potential growth mechanisms based on the temperature-dependent observations in this work that enables the ability to produce a customized interface for ALD materials growth on polymer substrates.