Conventional fabrication methods for realization of metal mesh (MM) based transparent conductive film (TCF) are not economic and environmentally friendly. By combination of the scrape and selective electroplating techniques, a vacuum sputtering/evaporation-free process is explored for fabrication of high-performance MM based TCF. The fabricated TCF exhibits ultra-low sheet electrical resistance (Rs = 0.07 Ω sq-1) at average transmittance of 83% in visible region. The sample cannot only exhibit high heating temperatures (140 °C) at low input voltage (1.5 V) with fast and stable thermal response but provide high electromagnetic interference shielding efficiency (EMI SE) more than 43 dB in X-band. The processing chain provides a robust, powerful and scalable platform, which may open up a new avenue for realizing multifunctional TCF in diverse applications.
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Shen et al. (2018) studied this question.
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