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January 1, 2000Journal of The Electrochemical Society

Effect of Applied Potential on the Chemical Mechanical Polishing of Aluminum in Phosphoric Acid Base Slurry

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HKHong-Shi KuoInstitute of Physics, Academia Sinica WTWen‐Ta TsaiElectrochemical Society

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Kuo et al. (2000) studied this question.

synapsesocial.com/papers/6ab097ed7fc764abaaf33123 https://doi.org/10.1149/1.1393498

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