Determination of Pole Distribution for Thin Film on a Thick Substrate by X-Ray Diffraction

In the case of thin films grown on such a thick substrate that the X-rays cannot pass through, the available methods for measurement of X-rays to determine the pole distribution in the film are the reflection methods, although they have unobservable angle zones in common. In order to cover such a blind zone and to get a particular pole distribution in the film over the entire angle range, different pole distributions are obtained and are united into one normalized pole distribution by making reference to the pole distribution in an ideal sample with random orientation of crystallites. The simple combination method proposed here is applied to the determination of the normalized (00·2) pole distribution in sputtered hexagonal Co thin films.