SON68 glass alteration under Si-rich solutions at low temperature (35–90 °C): kinetics, secondary phases and isotopic exchange studies

Pristine and 29 Si-doped SON68 glass were leached in dynamic mode in Si-rich COx water at 42 ppm, pH 8, (35–90 °C) and S/V (900–1800 m −1 ). Diffusion and surface reaction process governed the glass alteration. The residual rate at 90 °C to 653 days is about 10 −3 g m −2 d −1 .