The application of chelation chemistry to the etching or removal of iron and iron oxide is investigated. Reactions of iron and iron oxide with 1,1,1,5,5,5‐hexafluoro‐2,4‐pentanedione , 1,1,1‐trifluoro acetic acid , and trimethylsilyl‐1,1,1,5,5,5‐hexafluoro‐2,4‐pentanedione (SEE + hfac) provide insight into the mechanisms responsible for etching and removal of iron and iron oxide. Substitutional nucleophilic exchange reactions are only partially responsible for the removal of Fe. In addition, decomposition at the gamma carbon results in the formation of volatile complexes of trifluoroacetates (tfa) and hexafluoropentandionates (hfac). Although decomposition of occurs at iron surfaces, it appears to have little effect on etching or cleaning process.
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George et al. (1996) studied this question.