Laser ablation deposition of metal oxides/nitrides films at room temperature

We report on the role of laser ablated plume size for deposition of aluminum films in oxygen and nitrogen ambient atmosphere. The films were deposited at room temperature and were characterized using x-ray diffraction, scanning electron microscopy, and micro-Raman. The formation of aluminum nitride is attributed to breakdown of nitrogen gas due to high shock temperature and subsequent mixing with aluminum plasma in the shocked region.