Enhancement of electroluminescence in p–i–n structures with nano-crystalline Si/SiO2multilayers

Nano-crystalline Si/SiO 2 multilayers were prepared by alternately changing the ultra-thin amorphous Si film deposition and the in situ plasma oxidation process followed by the post-annealing treatments. Well-defined periodic structures can be achieved with 2.5 nm thick SiO 2 sublayers. It is shown that the size of formed nano-crystalline Si is about 3 nm. Room temperature electroluminescence can be observed and the spectrum contains two luminescence bands located at 650 nm and 520 nm. In order to improve the hole injection probability, p–i–n structures containing a nanocrystalline Si/SiO 2 luminescent layer were designed and fabricated on different p-type substrates. It is found that the turn-on voltage of p–i–n structures is obviously reduced and the luminescence intensity increases by 50 times. It is demonstrated that the use of a heavy-doped p-type substrate can increase the luminescence intensity more efficiently compared with the light-doped p-type substrate due to the enhanced hole injection.