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April 15, 1992Journal of Applied Physics

Charge accumulation and band edge in the double barrier tunneling structure

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Authors

YFYifeng FuBeijing Institute of TechnologyMWM. WillanderLinköping University

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Fu et al. (1992) studied this question.

synapsesocial.com/papers/6ab337f79ac27ab200068b6bhttps://doi.org/10.1063/1.350853
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