Reaktionen an Silicium‐Silicium‐Bindungen, 3. Ein neuer Weg zur Knüpfung von Si – Ge‐und Si – Sn‐Bindungen: Hexachlordisilan‐Spaltung von Organometallphosphanen und (Trichlorsilyl)phosphan‐Recycling

Reactions at Silicon‐Silicon Bonds, 3[1]. – A New Path to Si – Ge and Si – Sn Bonds: Hexachlorodisilane Cleavage of Organometalphosphanes and (Trichlorosilyl)phosphane Recycling Trimethyl(trichlorsilyl)germane and ‐stannane (4, 5) have been prepared through hexachlorodisilane cleavage by germyl‐and stannylphosphanes R2PMMe3 (1, 2, Ri1‐C3H7, t1‐C4H9; MGe, Sn). The (trichlorosilyl)phosphane byproduct R2PSiCl3 (3) may be recycled by transmetalation and methylation steps to provide starting germylphosphane (MeGeCl3, 2 MeLi) and stannylphosphane (Me3SnCl, 3 MeLi).