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January 1, 1993Journal of The Electrochemical Society

Wafer Temperature Dependence of the Vapor‐Phase HF Oxide Etch

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Authors

MWMan WongHong Kong University of Science and TechnologyMMMehrdad M. MoslehiOptiPro Systems (United States)RBR. A. BowlingTexas Instruments (United States)

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Cite This Study

Wong et al. (1993) studied this question.

synapsesocial.com/papers/6ab349277caff4f3d1cb63fehttps://doi.org/10.1149/1.2056088
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