A novel plasma system based on double-pipe method was generated for the development of an atmospheric-pressure-plasma jet (APPJ). This APPJ deposits homogeneous thin films without unfavorable contamination in plasma source. The experimentally measured gas-phase temperature of the argon APPJ maintained at RF electric power was around 40degC-80degC, indicating this APPJ to be a low-temperature plasma. This plasma system will provide a chamber less deposition for coating application.
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Huang et al. (2009) studied this question.
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