A study has been conducted of the effects of deposition conditions on the radiation hardness of borophosphosilicate glass (BPSG). Films deposited by two common deposition techniques were evaluated using gamma cell testing, electron spin resonance (ESR), and capacitance voltage (CV) measurements. The results indicate that two stoichiometrically similar films can differ greatly in radiation tolerance depending on the deposition conditions.
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Fuller et al. (1996) studied this question.
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