Polarization modification in InGaN/GaN multiple quantum wells by symmetrical thin low temperature-GaN layers

Light emitting diodes (LEDs) using InGaN/GaN quantum wells (QWs) with thin low temperature GaN (LT-GaN) layers bounding each InGaN layer are grown by metal-organic vapor phase epitaxy. The light output power of such LEDs increases by a factor of 2 at a drive current density of 35 A/cm2 compared to that from reference LEDs without the LT-GaN. The blueshift in the emission wavelength is 5.2 nm when the current density increases from 3 to 50 A/cm2, which is much smaller than the shift 8.1 nm from reference LEDs. Moreover, the efficiency droop at high current injection is also reduced by 28%, and current density at which peak efficiency is observed increases from 1 to 2 A/cm2. High resolution transmission electron microscopy of the QWs bounded with LT-GaN shows higher quality and less strain compared to the reference samples. The better performance of LEDs incorporating the LT-GaN layers is attributed to suppressed polarization from piezoelectric fields.