The infrared multiphoton decomposition of silane in the presence of methyl acrylate, acrolein, allyl methyl ether, allyl acetate, methyl vinyl ether, and vinyl acetate results in the formation of various gaseous compounds and the gas-phase deposition of solid material on cold reactor surfaces. Both multistep molecular reactions between silylene and the oxygenated olefins and radical processes are thought to contribute to the formation of the solid deposit. The latter incorporates all the silicon of reacted silane, the structure of which is inferred from IR and ESCA analysis to consist of different siloxane units.
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Papoušková et al. (1990) studied this question.
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