The paper presents the application of two advanced thick‐film techniques: etching of fired thick‐films and photoimaging of photosensitive thick‐films for fabrication bandpass microwave filters operating in the frequency range from 6 to 14 GHz. Modified screen printing through ultra‐thin calendered screens is used for comparative goals. Advanced techniques are combined with novel thick‐film conductors including photosensitive pastes and etchable pastes.
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Dziurdzia et al. (1999) studied this question.