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November 1, 1987Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Pressure dependence of the growth of polycrystalline silicon by low-pressure chemical-vapor deposition

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Authors

DMD. MeakinSiemens (Germany)KPKaterina PapadopoulouAristotle University of ThessalonikiSFS. Friligkos

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Meakin et al. (1987) studied this question.

synapsesocial.com/papers/6ab5c030e4fdc8f74d430201https://doi.org/10.1116/1.583671
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