Generation of Highly Uniform Plasma on the Grounded Electrode Surface by Radio Frequency Discharge with the Use of Modified Multi Hollow Cathodes

A highly uniform plasma with the uniformity of ±1.7% for the ion saturation current was produced over the surface of flat grounded electrode. The approach is based on modifying the hollow-cathode so that the distribution of the ion saturation current over the electrode surface may be uniform by optimizing the distribution of the width of the grooves on the hollow cathode. The highly uniform plasma in the modifying hollow-cathode discharge also inherits the remarkable properties of the high electron density and the low electron temperature of the hollow-cathode discharge on the grounded electrode surface.