Observed trapping of minority-carrier electrons in p-type GaAsN during deep-level transient spectroscopy measurement

Deep-level transient spectroscopy measurements on a reverse-biased p-type GaAsN Schottky diode grown by metalorganic chemical vapor deposition show a minority-carrier trap signal corresponding to an electron trap having an activation energy of about 0.2eV. The proportion of trapped electrons agrees with that of modeled defect states near the Schottky-barrier metal interface whose occupation is affected by changing reverse-bias conditions. Estimates of thermionic emission provide adequate filling of the traps with electrons from the metal. The inclusion of a GaAs layer between the metal and GaAsN layer reduces the electron-trapping signal.