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May 1, 1999Journal of The Electrochemical SocietyOpen Access

Comparison of Tetrakis(dimethylamido)titanium and Tetrakis(diethylamido)titanium as Precursors for Metallorganic Chemical Vapor Deposition of Titanium Nitride

Ju‐Young Yun Man‐Young Park Shi‐Woo Rhee

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Abstract

Comparison of Tetrakis(dimethylamido)titanium and Tetrakis(diethylamido)titanium as Precursors for Metallorganic Chemical Vapor Deposition of Titanium Nitride, Yun, Ju‐Young, Park, Man‐Young, Rhee, Shi‐Woo

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Yun et al. (1999) studied this question.

synapsesocial.com/papers/6ab731f388223941828ed8d3 https://doi.org/10.1149/1.1391847

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