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Three-dimensional diamond-like carbon (DLC) mold fabricated by focused-ion-beam chemical vapor deposition (FIB-CVD) using a precursor of phenanthrene has been applied to a nanoimprint process. Various 3D nanostructure DLC molds have been delineated by FIB-CVD using a computer-controlled pattern generator which is a commercially available pattern generator for electron beam lithography. Then, the molds were imprinted into hydrogen silsequioxane (HSQ) as a material replicated at room temperature. It was confirmed that the 3D mold, after nanoimprint lithography (NIL), kept its original shape, and 3D mold structures were successfully imprinted into HSQ. These results reveal that the 3D mold fabricated by FIB-CVD can be applied to NIL.
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Morita et al. (2003) studied this question.
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