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March 1, 1986IEEE Transactions on Electron Devices

SPE-CoSi2submicrometer lines by lift-off using selective reaction and its application to a permeable-base transistor

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Epitaxial CoSi2submicrometer lines along the

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Cite This Study

Ishibashi et al. (1986) studied this question.

synapsesocial.com/papers/6ab772f4d2c1437f300e4bd6 https://doi.org/10.1109/t-ed.1986.22490

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Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

1Cobalt silicide layers on Si. I. Structure and growthOriginal Research · 1975 · 124 citations
2Field-effect transistor versus analog transistor (static induction transistor)Original Research · 1975 · 411 citations
3Study of the uniformity and stoichiometry of CoSi2 films using Rutherford backscattering spectroscopy and scanning electron microscopyOriginal Research · 1983 · 21 citations
4Fabrication and numerical simulation of the permeable base transistorOriginal Research · 1980 · 199 citations