Poly(Vinyl 2‐furylacrylate), a new photosensitive polymer

Poly(vinyl 2‐furylacrylate), a new photosensitive polymer, was prepared, and its photosensitivity was investigated. The polymer cannot be synthesized by the usual procedure, condensation of poly(vinyl alcohol) and 2‐furylacrylyl chloride in hot pyridine, but is easily prepared by the aqueous alkaline process, regardless of the degree of polymerization. Poly(vinyl 2‐furylacrylate) is remarkably highly photosensitive and is spectrally sensitized by aromatic nitro compounds and aromatic carbonyl compounds. The mechanism of photochemical reaction is considered to involve the dimerization of the furylacrylyl group, and the quantum yield appears to be constant.