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The patterning metal nanoparticles by a combination of conventional UV irradiation on PMMA and the reduction of PdII bis(acetylacetonato) is reported. PMMA does not reduce the metal complex as much as other polymers do, but exposure to UV enhances the reducing power against the metal complex and enables Pd particles to be patterned on PMMA films when irradiated through a photomask (see Figure).
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Horiuchi et al. (2003) studied this question.
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