Kinetic growth of randomlike and ballisticlike deposition models

The pattern structure and the scaling behavior of the surface width for two deposition models of two kinds of particles, particle A with a probability 1-P and particle C with a probability P, depositing on a (1+1)-dimensional substrate are studied. For model I, a randomlike deposition model, the pattern has a compact structure, and the surface width growth only depends on the time, W{~}t1/2 for the early stage and W{~}t^β(P) for the intermediate time where {β} is a function of P, as well as W{~}P^-γ for the later time. For model II, a ballisticlike deposition model, the pattern and scaling behavior are similar to the ballistic deposition. The scaling of the surface width is W{~}t^β(P) for the early stage of growth and W{~}L^α for the later stage. The exponent {β} is a function of P, while {α} is independent of P.