Films selected for anticipated reaction with atomic oxygen, namely carbon, silver, and osmium, were exposed during the Shuttle STS‐4 mission. A silver film 225 ± 5 nm thick was converted to a transparent blue‐green interference film 355 ± 5 nm thick. Both carbon and osmium films 10‐30 nm thick apparently formed volatile oxides and disappeared, except where well shielded. A calculated total of approximately 7 × 1019 oxygen atoms per cm² struck the surfaces, which could have removed on the order of 3 µm of material if only 10% reacted. The absence of apparent effects on adjacent thin and thick gold films is offered as evidence that sputtering is not responsible.
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Peters et al. (1983) studied this question.
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