In this paper we will first report on the use of real‐time determination of wafer temperature for transparent substrates. With this method we will study the unintentional influence of growth parameter variations on the surface temperature. The effect on nitride growth optimization will be discussed. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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Hardtdegen et al. (2005) studied this question.
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