A route to produce novel chemically functionalized carbon nanosieves with a thickness of only ≈1nm is presented. The nanosieves (see image) have areas of up to ≈1mm2 with regular openings down to ≈30nm. Carbon nanosieves are made via nanopatterning of self-assembled monolayers of 4′-nitro-1,1′-biphenyl-4-thiols by extreme UV interference lithography.
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Schnietz et al. (2009) studied this question.
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