Self-assembly of fullerite-boron film layers on a Si(111) substrate deposited by the thermal vacuum method

This work demonstrates the possibility of synthesizing multilayer fullerite-boron films by the thermal vacuum induction deposition method, whose layers are formed as a result of self-assembly on a crystalline Si(111) substrate. The deposition of films onto the substrate was carried out from two crucibles containing fullerite and boron, which made it possible to solve the problem of simultaneous evaporation of two substances with significantly different properties (refractory and low-melting). The results of a study of the structure and phase composition of the fullerite-boron film are presented. The multilayer structure of the film was determined by scanning electron microscopy. Using X-ray photoelectron spectroscopy, a C-B chemical bond characteristic of the B4C compound was detected in the films.