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Distributed Bragg reflectors (DBRs) are essential passive photonic components for spectral selectivity and optical field confinement, yet high-performance DBRs remain largely absent from the van der Waals (vdW) materials platform. Here we report a submicron-thick vdW DBR composed of alternating multilayer tungsten disulfide (WS2) and hexagonal boron nitride (hBN), establishing a compact passive optical building block for all-vdW photonics. Enabled by the large refractive-index contrast between multilayer WS2 and hBN, the 576 nm-thick DBR exhibits an experimental reflectance exceeding 97% and a stopband spanning 660 to 1060 nm. When integrated with tungsten diselenide (WSe2), the vdW DBR increases the layer-resolved absolute absorptance of the ∼4 nm WSe2 layer from 8% to 34% near the excitonic resonance, and photodetectors incorporating the DBR show an approximately 18.5-fold enhancement in responsivity at 750 nm relative to bare devices. Additional molybdenum disulfide (MoS2)/hBN DBR further demonstrates that the design is generalizable across transition metal dichalcogenide (TMD)/hBN material systems. These results show that layered vdW materials can serve not only as active optoelectronic media but also as high-performance passive photonic components, opening a route toward compact, integrable all-vdW optoelectronic and on-chip photonic platforms.
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Wang et al. (2026) studied this question.
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